Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and system for forming a conformal silicon carbon nitride layer and structure formed using same

Method and system for forming a conformal silicon carbon nitride layer and structure formed using same

US Patent 12031205 · Granted Jul 9, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and system for forming silicon nitride layer using low radio frequency pl2025
Endoscope system and image processing method2025
Methods for forming a topographically selective silicon oxide film by a cyclical2025
Customer information registration apparatus2024
Customer information registration apparatus2024
Customer information registration apparatus2024
Methods and apparatuses for flowable gap-fill2024
Surface-coated TiN-based cermet cutting tool in which hard coating layer exhibit2024
Customer information registration apparatus2024
Reception apparatus, reception system, reception method, and storage medium2023
Customer information registration apparatus2023
Endoscope system and image processing method2023