Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Composition for forming block copolymer layer for formation of microphase-separated pattern

Composition for forming block copolymer layer for formation of microphase-separated pattern

US Patent 12030974 · Granted Jul 9, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Resist underlayer film-forming composition containing alicyclic compound-termina2025
Resist underlayer film-forming composition containing alicyclic compound-termina2025
Resist underlayer film forming composition having a disulfide structure2025
Resist underlayer film forming composition having a disulfide structure2025
Composition for forming coating film and method for manufacturing semiconductor 2024
Chemical-resistant protective film-forming composition containing polymerization2024
Resist underlayer film-forming composition and method for forming resist pattern2024
Resist underlayer film-forming composition and method for forming resist pattern2024
Resist underlayer film-forming composition and method for forming resist pattern2024
Method and device for producing liquid culture medium composition2024
Method and device for producing liquid culture medium composition2024
Composition for forming silicon-containing resist underlayer film removable by w2023