Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Plasma enhanced wafer soak for thin film deposition

Plasma enhanced wafer soak for thin film deposition

US Patent 12014921 · Granted Jun 18, 2024

Estimated economic value: $233,164,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Wafer lift pin mechanism for preventing local backside deposition2025
Organoaminodisilazanes for high temperature atomic layer deposition of silicon o2025
Optical system, image capturing apparatus and electronic apparatus2025
Etch stop layer2024
Defect control and stability of DC bias in RF plasma-based substrate processing 2020
Defect control and stability of DC bias in RF plasma-based substrate processing 2018
Method for supplying vaporized precursor2017
Systems and methods for improving deposition rate uniformity and reducing defect2017
Method and apparatus to minimize seam effect during TEOS oxide film deposition2017
Method for the reduction of defectivity in vapor deposited films2016
Method for the reduction of defectivity in vapor deposited films2016
Metal sheets and plates having friction-reducing textured surfaces and methods o2016