Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Processing chamber condition and process state monitoring using optical reflector attached to processing chamber liner

Processing chamber condition and process state monitoring using optical reflector attached to processing chamber liner

US Patent 12000041 · Granted Jun 4, 2024

Estimated economic value: $68,807,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Process characterization and correction using optical wall process sensor (OWPS)2025
Transmission corrected plasma emission using in-situ optical reflectometry2025
Capacitive sensors and capacitive sensing locations for plasma chamber condition2025
Smart camera substrate2025
Confocal chromatic metrology for EUV source condition monitoring2025
Capacitive sensor housing for chamber condition monitoring2024
Differential capacitive sensor for in-situ film thickness and dielectric constan2024
Smart camera substrate2024
Transmission corrected plasma emission using in-situ optical reflectometry2024
Thin film, in-situ measurement through transparent crystal and transparent subst2024
Sensors and system for in-situ edge ring erosion monitor2024
Differential capacitive sensors for in-situ film thickness and dielectric consta2023