Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of operating a deposition or cleaning apparatus

Method of operating a deposition or cleaning apparatus

US Patent 11970774 · Granted Apr 30, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Atomic layer deposition with plasma source2025
Substrate processing apparatus and method2025
Substrate processing methods and apparatus2025
Adjustable fluid inlet assembly for a substrate processing apparatus and method2024
Deposition or cleaning apparatus with movable structure2023
Adjustable fluid inlet assembly for a substrate processing apparatus and method2022
ALD method and apparatus2020
ALD method and apparatus including a photon source2020
Deposition reactor with plasma source2019
Protecting an interior of a hollow body with an ALD coating2019
Atomic layer deposition with plasma source2018
Protecting a target pump interior with an ALD coating2018