Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for determining an effect of one or more pixels to be introduced into a substrate of a photolithographic mask

Method and apparatus for determining an effect of one or more pixels to be introduced into a substrate of a photolithographic mask

US Patent 11914289 · Granted Feb 27, 2024

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Device and method for processing a microstructured component2022
Method and apparatus for compensating defects of a mask blank2022
Method and apparatus for performing an aerial image simulation of a photolithogr2022
Method and apparatus for performing an aerial image simulation of a photolithogr2022
Method and apparatus for determining positions of a plurality of pixels to be in2022
Method and apparatus for determining positions of a plurality of pixels to be in2022
Method and apparatus for determining positions of a plurality of pixels to be in2022
Method and apparatus for determining a wavefront of a massive particle beam2022
Optical system and method for correcting mask defects using the system2022
Optical system and method for correcting mask defects using the system2022
Optical system and method for correcting mask defects using the system2022
Method for correcting the critical dimension uniformity of a photomask for semic2020