Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Model for calculating a stochastic variation in an arbitrary pattern

Model for calculating a stochastic variation in an arbitrary pattern

US Patent 11835862 · Granted Dec 5, 2023

Estimated economic value: $61,014,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Failure model for predicting failure due to resist layer2022
Model for calculating a stochastic variation in an arbitrary pattern2021
Optimization of a lithography apparatus or patterning process based on selected 2021
Model for estimating stochastic variation2020
Model for calculating a stochastic variation in an arbitrary pattern2020
Source mask optimization to reduce stochastic effects2018
Illumination system and lithographic apparatus2017
Process tuning with polarization2017
Source mask optimization to reduce stochastic effects2015
Illumination system and lithographic apparatus2015
Polarization designs for lithographic apparatus2015
Source-mask optimization in lithographic apparatus2014