Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Ferroelectric device film stacks with texturing layer, and method of forming such

Ferroelectric device film stacks with texturing layer, and method of forming such

US Patent 11659714 · Granted May 23, 2023

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Doped polar layers and semiconductor device incorporating same2025
Asynchronous carry-ripple adder with majority or minority gates2025
Perovskite-based magnetoelectric spin-orbit logic devices2025
Perovskite-based magnetoelectric spin-orbit logic devices2025
Integrating embedded memory with logic interconnects2025
Integrating embedded memory with logic interconnects2025
Method of forming capacitors through wafer bonding2025
Method of forming capacitors through wafer bonding2025
Method of forming capacitors through wafer bonding2025
High-density low voltage non-volatile memory with unidirectional plate-line and 2025
High-density low voltage non-volatile memory with unidirectional plate-line and 2025
Ripple carry adder with ferroelectric or paraelectric wide-input minority or maj2025