Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for coating photo resist over a substrate

Method and apparatus for coating photo resist over a substrate

US Patent 11545361 · Granted Jan 3, 2023

Estimated economic value: $10,844,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Photoresist and formation method thereof2025
Photoresist and formation method thereof2025
Method of manufacturing a semiconductor device and semiconductor device manufact2025
Method and apparatus for coating photo resist over a substrate2025
Method and apparatus for coating photo resist over a substrate2025
Method and apparatus for coating photo resist over a substrate2025
Method and apparatus for coating photo resist over a substrate2025
Silicon-containing compounds for lubricants2025
Melamine-based compounds for lubricating compositions2025
Nitrogen plasma treatment for improving interface between etch stop layer and co2024
Device for applying magnetic field to a filter for reducing metallic contaminant2024
Device for applying magnetic field to a filter for reducing metallic contaminant2024