Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Continuous gate and fin spacer for advanced integrated circuit structure fabrication

Continuous gate and fin spacer for advanced integrated circuit structure fabrication

US Patent 11462436 · Granted Oct 4, 2022

Estimated economic value: $13,460,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Fin cut and fin trim isolation for advanced integrated circuit structure fabrica2025
Fin cut and fin trim isolation for advanced integrated circuit structure fabrica2025
Fin cut and fin trim isolation for advanced integrated circuit structure fabrica2025
Trench plug hardmask for advanced integrated circuit structure fabrication2025
Trench plug hardmask for advanced integrated circuit structure fabrication2025
Fin end plug structures for advanced integrated circuit structure fabrication2025
Fin end plug structures for advanced integrated circuit structure fabrication2025
Fin end plug structures for advanced integrated circuit structure fabrication2025
Self-aligned contacts2025
Trench contact structures for advanced integrated circuit structure fabrication2025
Trench contact structures for advanced integrated circuit structure fabrication2025
Dual metal silicide structures for advanced integrated circuit structure fabrica2025