Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method of simulating resist pattern, resist material and method of optimizing formulation thereof, apparatus and recording medium

Method of simulating resist pattern, resist material and method of optimizing formulation thereof, apparatus and recording medium

US Patent 11353793 · Granted Jun 7, 2022

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Thioxanthone derivatives, composition comprising the same and pattern forming me2025
Method and process for stochastic driven detectivity healing2021
Methods for sensitizing photoresist using flood exposures2021
Light source device and optical engine2021
Light source device2021
Optical processing apparatus and substrate processing apparatus2020
Exposure apparatus, exposure apparatus adjustment method and storage medium2020
Methods and techniques to use with photosensitized chemically amplified resist c2020
Optical processing apparatus, coating/development apparatus, optical processing 2020
Photo-sensitized chemically amplified resist (PS-CAR) simulation2019
Light emitting device and substrate2019
Exposure apparatus, exposure method and storage medium2019