{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Systems and methods for UV-based suppression of plasma instability", "item": "https://www.patentleaderboard.com/patent/11120989"}]}
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Home › Systems and methods for UV-based suppression of plasma instability

Systems and methods for UV-based suppression of plasma instability

US Patent 11120989 · Granted Sep 14, 2021

Estimated economic value: $731,700,000 ⓘ

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