Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for producing a mirror as an optical component for an optical system of a projection exposure apparatus for projection lithography

Method for producing a mirror as an optical component for an optical system of a projection exposure apparatus for projection lithography

US Patent 11092897 · Granted Aug 17, 2021

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Damping arrangement for vibration damping of an element in an optical system2025
Compensation of creep effects in an imaging device2022
Projection exposure apparatus for semiconductor lithography2022
Method for positioning a component of an optical system2021
Optical element for the beam guidance of imaging light in projection lithography2021
Optical imaging arrangement with actively adjustable metrology support units2021
EUV exposure apparatus with reflective elements having reduced influence of temp2020
Projection exposure apparatus, and method for reducing deformations, resulting f2020
Optical imaging arrangement with a piezoelectric device2019
EUV exposure apparatus with reflective elements having reduced influence of temp2019
EUV exposure apparatus with reflective elements having reduced influence of temp2018
EUV imaging apparatus2018