Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System and method for performing a multi-etch process using material-specific behavioral parameters in a 3-D virtual fabrication environment

System and method for performing a multi-etch process using material-specific behavioral parameters in a 3-D virtual fabrication environment

US Patent 11048847 · Granted Jun 29, 2021

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

System and method for process window optimization in a virtual semiconductor dev2025
System and method for process window optimization in a virtual semiconductor dev2025
System and method for multi-material mesh generation from fill-fraction voxel da2024
System and method for multi-material mesh generation from fill-fraction voxel da2024
System and method for performing process model calibration in a virtual semicond2024
System and method for performing process model calibration in a virtual semicond2024
Determination of recipes for manufacturing semiconductor devices2023
System and method for predictive 3-D virtual fabrication2023
System and method for predictive 3-D virtual fabrication2023
System and method for predictive 3-D virtual fabrication2023
System and method for predictive 3-D virtual fabrication2023
Resist and etch modeling2023