Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › High lateral to vertical ratio etch process for device manufacturing

High lateral to vertical ratio etch process for device manufacturing

US Patent 11031233 · Granted Jun 8, 2021

Estimated economic value: $87,142,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Notching mold2025
Method for aerosolized quantum dots2025
Apparatus for predicting traffic flow on new road and method thereof2025
Method for manufacturing secondary battery and pouch for secondary battery2025
Method and apparatus for de-identification of personal information2025
Method for displaying three-dimensional augmented reality2024
Ash rate recovery method in plasma strip chamber2024
Deep auto-encoder for equipment health monitoring and fault detection in semicon2024
Secondary battery and method for manufacturing the same, and pressing block for 2023
Pouch for a secondary battery including a bridge and accommodation grooves2023
Washing machine2023
Method of generating three-dimensional model data of object2023