Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for deposition cleaning in a pumping line

Method and apparatus for deposition cleaning in a pumping line

US Patent 11024489 · Granted Jun 1, 2021

Estimated economic value: $83,679,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for plasma ignition in toroidal plasma sources2025
Method and apparatus for plasma generation2024
Valve apparatuses and related methods for reactive process gas isolation and fac2023
Endpoint detection of deposition cleaning in a pumping line and a processing cha2023
Method and apparatus for plasma generation2023
Predictive diagnostics systems and methods using vacuum pressure control valves2022
Predictive diagnostics systems and methods using vacuum pressure control valves2022
Method and apparatus for deposition cleaning in a pumping line2022
Method and apparatus for deposition cleaning in a pumping line2022
Method and apparatus for deposition cleaning in a pumping line2022
Microwave applicator with solid-state generator power source2022
Actively cooled vacuum isolation valve2021