Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Immersion lithography system using a sealed wafer bath

Immersion lithography system using a sealed wafer bath

US Patent 11003097 · Granted May 11, 2021

Estimated economic value: $10,475,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor fabrication apparatus and method of using the same2025
Film deposition for patterning process2025
Photoresist composition and method of manufacturing a semiconductor device2025
Non-DMSO stripper for advance package metal plating process2025
EUV metallic resist performance enhancement via additives2025
Method of manufacturing semiconductor devices and pattern formation method2025
Method of manufacturing a semiconductor device2025
Treatment of spin on organic material to improve wet resistance2025
Method for forming and using mask2025
Semiconductor device and method2025
Semiconductor device and method2025
Photoresist composition and method of forming photoresist pattern2025