Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Tungsten post-CMP cleaning composition

Tungsten post-CMP cleaning composition

US Patent 10988718 · Granted Apr 27, 2021

Estimated economic value: $30,849,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Post CMP cleaning composition2025
Post CMP cleaning composition2025
Cleaning composition with molybdenum etching inhibitor2025
Method of manufacturing semiconductor device2025
Formulations for high selective silicon nitride etch2025
Post CMP cleaning compositions2024
Post CMP cleaning compositions2024
Compositions and methods for post-CMP cleaning of cobalt substrates2023
Compositions and methods for post-CMP cleaning of cobalt substrates2023
Compositions and methods for post-CMP cleaning of cobalt substrates2023
Wet etching composition and method2023
Wet etching composition and method2023