Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Geometric control of bottom-up pillars for patterning applications

Geometric control of bottom-up pillars for patterning applications

US Patent 10930503 · Granted Feb 23, 2021

Estimated economic value: $34,793,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Pulsed plasma (DC/RF) deposition of high quality C films for patterning2025
Processes for depositing SiB films2025
High density carbon films for patterning applications2025
Electronic device fabrication using area-selective deposition2025
Low temperature graphene growth2025
Methods of forming thermally stable carbon film2025
Methods and apparatus for selective etch stop capping and selective via open for2025
Deposition of conformal and gap-fill amorphous silicon thin-films2025
Methods to reduce UNCD film roughness2025
Ultra-high modulus and etch selectivity boron-carbon hardmask films2025
Defect free germanium oxide gap fill2025
High pressure oxidation of metal films2024