Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Manufacturing method of high-dielectric-constant gate insulating film of semiconductor device

Manufacturing method of high-dielectric-constant gate insulating film of semiconductor device

US Patent 10886132 · Granted Jan 5, 2021

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Passage opening and closing device2024
Light irradiation type heat treatment apparatus including oxygen analyzer and he2023
Heat treatment method including low temperature degassing before flash lamp anne2023
Light irradiation type heat treatment method and heat treatment apparatus that c2022
Light-irradiation type thermal processing method and thermal processing apparatu2022
Non-combustion suction device2021
Method for fabricating p-type gallium nitride semiconductor and method of heat t2021
Light-irradiation heat treatment method and heat treatment apparatus2021
Light-irradiation heat treatment method and heat treatment apparatus2020
Dopant introduction method and thermal treatment method2020
Hypoid gear design method and hypoid gear2020
Light-irradiation heat treatment method and heat treatment apparatus2020