Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › In-situ real-time plasma chamber condition monitoring

In-situ real-time plasma chamber condition monitoring

US Patent 10854433 · Granted Dec 1, 2020

Estimated economic value: $39,153,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Edge defect detection via image analytics2025
Clog detection via image analytics2024
Method of forming an integrated circuit using a patterned mask layer2024
Method of forming an integrated circuit using a patterned mask layer2022
Method of forming an integrated circuit using a patterned mask layer2020
Method of fabricating a semiconductor structure2019
Method of forming an integrated circuit using a patterned mask layer2018
Composite dummy gate with conformal polysilicon layer for FinFET device2018
Method of fabricating a semiconductor structure2017
Method of forming an integrated circuit using a patterned mask layer2017
Composite dummy gate with conformal polysilicon layer for FinFET device2016
FinFETs and methods for forming the same2016