Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Fabrication method of a metal gate structure

Fabrication method of a metal gate structure

US Patent 10840149 · Granted Nov 17, 2020

Estimated economic value: $11,687,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Semiconductor device and method for forming the same2025
Revising IC layout design to eliminate gaps between isolation structures2025
Testing structure for an integrated chip having a high-voltage device2025
Techniques for heat dispersion in 3D integrated circuit2025
Embedded flash memory device with floating gate embedded in a substrate2025
Integrated circuit structure with gate structures on grids and method for formin2025
Planarization-less phase change material switch2025
Embedded memory device with reduced plasma-induced damage and methods of forming2025
Energy harvest and storage device for semiconductor chips and methods for formin2025
Gate isolation features in semiconductor devices and methods of fabricating the 2025
Etch stop layer for memory device formation2025
External magnetic field detection for MRAM device2025