Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Substrate processing apparatus, method of coating particle in process gas nozzle and substrate processing method

Substrate processing apparatus, method of coating particle in process gas nozzle and substrate processing method

US Patent 10799896 · Granted Oct 13, 2020

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Gas introduction structure, treatment apparatus, and treatment method2022
Substrate processing apparatus, exhaust pipe coating method and substrate proces2020
Film forming apparatus and film forming method2020
Film forming apparatus, film forming method and non-transitory storage medium2020
Method for removing metal impurity from quartz component part used in heat proce2014
Vertical plasma processing apparatus for semiconductor process2013
RF electrode for a process tube of semiconductor manufacturing apparatus2008
Silicon dioxide film forming method2007
Process tube for semiconductor device manufacturing apparatus2006
Process tube for semiconductor device manufacturing apparatus2006
Process tube for semiconductor device manufacturing apparatus2006
System and method for heat treating semiconductor2005