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Home › Imprint apparatus that forms a pattern of an imprint material on a substrate-side pattern region of a substrate using a mold, and related methods

Imprint apparatus that forms a pattern of an imprint material on a substrate-side pattern region of a substrate using a mold, and related methods

US Patent 10663858 · Granted May 26, 2020

Estimated economic value: $28,000 ⓘ

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