Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Systems and methods for controlling substrate approach toward a target horizontal plane

Systems and methods for controlling substrate approach toward a target horizontal plane

US Patent 10593586 · Granted Mar 17, 2020

Estimated economic value: $46,935,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Controlling plating electrolyte concentration on an electrochemical plating appa2025
Lithographic system provided with a deflection apparatus for changing a trajecto2025
Electrochemical deposition system including optical probes2024
Lithographic apparatus and method with improved contaminant particle capture2024
Systems and methods for in-situ measurement of sheet resistance on substrates2024
Systems and methods for in-situ measurement of sheet resistance on substrates2024
Apparatus and method for determining a condition associated with a pellicle2024
Controlling plating electrolyte concentration on an electrochemical plating appa2024
Systems and methods for controlling substrate approach toward a target horizonta2023
Systems and methods for controlling substrate approach toward a target horizonta2023
Systems and methods for controlling substrate approach toward a target horizonta2023
Controlling plating electrolyte concentration on an electrochemical plating appa2022