{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Apparatus and methods for pulsed photo-excited deposition and etch", "item": "https://www.patentleaderboard.com/patent/10508341"}]}
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Home › Apparatus and methods for pulsed photo-excited deposition and etch

Apparatus and methods for pulsed photo-excited deposition and etch

US Patent 10508341 · Granted Dec 17, 2019

Estimated economic value: $25,541,000 ⓘ

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