Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Measurement system, lithographic system, and method of measuring a target

Measurement system, lithographic system, and method of measuring a target

US Patent 10437159 · Granted Oct 8, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Wavelength selection module, illumination system and metrology system2025
Detection apparatus for simultaneous acquisition of multiple diverse images of a2024
Metrology apparatus2022
Method and apparatus for measuring a parameter of interest using image plane det2021
Variable corrector of a wave front2020
Method of determining a value of a parameter of interest, method of cleaning a s2020
Optical systems, metrology apparatus and associated method2020
Focus control arrangement and method2020
Method of inspecting a substrate, metrology apparatus, and lithographic system2020
Method of inspecting a substrate, metrology apparatus, and lithographic system2020
Method of inspecting a substrate, metrology apparatus, and lithographic system2020
Beam homogenizer, illumination system and metrology system2019