Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Contamination control method of vapor deposition apparatus and method of producing epitaxial silicon wafer

Contamination control method of vapor deposition apparatus and method of producing epitaxial silicon wafer

US Patent 10379094 · Granted Aug 13, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for manufacturing semiconductor substrate2015
Method for manufacturing semiconductor substrate2015
Method for manufacturing semiconductor substrate2014
Semiconductor substrate, semiconductor device, and method of producing semicondu2013
Method for manufacturing semiconductor device2013
Semiconductor device having P-N column layer and method for manufacturing the sa2012
Method for manufacturing semiconductor device and epitaxial growth equipment2010
Manufacturing method of semiconductor wafer having a trench structure and epitax2010
Semiconductor device, method for manufacturing the same and method for evaluatin2010
Method for manufacturing semiconductor device2009
Manufacturing method of semiconductor substrate2008