Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Semiconductor device comprising work function metal pattern in boundry region and method for fabricating the same

Semiconductor device comprising work function metal pattern in boundry region and method for fabricating the same

US Patent 10332894 · Granted Jun 25, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Thin film transistor substrate and display device comprising the same2025
Transparent ultrasonic sensor-based ultrasonic optical composite imaging system2025
Semiconductor device having a cell separation pattern in contact with the bit li2025
Monitor2025
Semiconductor memory device2025
Semiconductor memory device2025
Shift lever for automobile2025
Coil component2025
Image encoder and decoder using unidirectional prediction2025
Method and system for smart evacuation guidance in road tunnel2025
Robot for guiding an evacuation route for persons in the space in the event of e2025
Unified speech/audio codec (USAC) processing windows sequence based mode switchi2025