Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Gas optimization in a gas discharge light source

Gas optimization in a gas discharge light source

US Patent 10218147 · Granted Feb 26, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Lithography system bandwidth control2023
Online calibration for repetition rate dependent performance variables2021
Gas optimization in a gas discharge light source2021
Lithography system bandwidth control2020
Online calibration for repetition rate dependent performance variables2020
Lithographic apparatus and method2020
Method for dither free adaptive and robust dose control for photolithography2018
Gas mixture control in a gas discharge light source2018
Estimating a gain relationship of an optical source2018
Controller for an optical system2018
Gas mixture control in a gas discharge light source2017
Online calibration for repetition rate dependent performance variables2017