Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System and process for calibrating pyrometers in thermal processing chambers

System and process for calibrating pyrometers in thermal processing chambers

US Patent 10190915 · Granted Jan 29, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Systems and methods for thermal processing and temperature measurement of a work2025
Low thermal budget annealing2021
Pre-heat processes for millisecond anneal system2021
Pre-heat processes for millisecond anneal system2020
Pre-heat processes for millisecond anneal system2019
Selective reflectivity process chamber with customized wavelength response and m2017
System and process for calibrating pyrometers in thermal processing chambers2014
Pulsed processing semiconductor heating methods using combinations of heating so2014
Method and system for determining optical properties of semiconductor wafers2014
Methods for determining wafer temperature2014
System and process for heating semiconductor wafers by optimizing absorption of 2014
Monitoring witness structures for temperature control in RTP systems2013