Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Formation of metal oxide layer

Formation of metal oxide layer

US Patent 10121652 · Granted Nov 6, 2018

Estimated economic value: $16,067,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Substrate treatment method for semiconductor device fabrication2020
Method and structure for a large-grain high-k dielectric2019
Die attachment for packaged semiconductor device2019
Bond pad structure for semiconductor device packaging2018
Method and structure for a large-grain high-K dielectric2017
Die attachment for packaged semiconductor device2017
Structure for aluminum pad metal under ball bond2016
Coating layer for a conductive structure2016
Methods and systems for selectively forming metal layers on lead frames after di2015
Modified high-K gate dielectric stack2014
Methods and structures for capping a structure with a protective coating2014
Lead frame sulfur removal2013