Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography

Method to improve adhesion of photoresist on silicon substrate for extreme ultraviolet and electron beam lithography

US Patent 10096477 · Granted Oct 9, 2018

Estimated economic value: $3,566,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Litho-litho-etch (LLE) multi color resist2024
Polymer brush adhesion promoter with UV cleavable linker2024
Alternating copolymer chain scission photoresists2024
Surface treatment of titanium containing hardmasks2023
Adhesion promoters2022
Three-dimensional microelectronic package with embedded cooling channels2022
Graded hardmask interlayer for enhanced extreme ultraviolet performance2022
Metal brush layer for EUV patterning2022
Polymer brush adhesion promoter with UV cleavable linker2021
Patterning material film stack with metal-containing top coat for enhanced sensi2021
Semiconductor microcooler2021
Semiconductor microcooler2021