Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System and method for loading a substrate holder carrying a batch of vertically placed substrates into an atomic layer deposition reactor

System and method for loading a substrate holder carrying a batch of vertically placed substrates into an atomic layer deposition reactor

US Patent 10041169 · Granted Aug 7, 2018

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Atomic layer deposition reactor comprising a top-loading reaction chamber config2025
Atomic layer deposition with plasma source2025
Protecting an interior of a gas container with an ALD coating2022
Method and apparatus for depositing thin films on a surface2022
Deposition reactor with plasma source2019
Atomic layer deposition apparatus and loading methods2018
Atomic layer deposition with plasma source2018
Atomic layer deposition with plasma source2015
Method of depositing material using a deposition reactor2014
Apparatus and methods for deposition reactors2014
Method for growing thin films2013
Atomic layer deposition apparatus and loading methods2012