Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5151219 | Use of particular mixtures of ethyl lactate and methyl ethyl ketone to remove undesirable peripheral material (e.g. edge beads) from photoresist-coated substrates | Marvin L. Love, Jr., Mark E. Towner | 1992-09-29 |
| 5063138 | Positive-working photoresist process employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent during photoresist coating | — | 1991-11-05 |
| 4965167 | Positive-working photoresist employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent | — | 1990-10-23 |
| 4886728 | Use of particular mixtures of ethyl lactate and methyl ethyl ketone to remove undesirable peripheral material (e.g. edge beads) from photoresist-coated substrates | Marvin L. Love, Jr., Mark E. Towner | 1989-12-12 |
| 4565776 | Photographic developer composition | Hongzoon Kim | 1986-01-21 |