Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5558978 | Photoresist compositions containing copolymers having acid-labile groups and recurring units derived from either N-(hydroxymethyl)maleimide or N-(acetoxymethyl)maleimide or both | Ulrich Sch adeli, Christoph De Leo, Heinz Holzwarth, Eric Tinguely | 1996-09-24 |
| 5554797 | Tetra (hydroxphenyl) alkanes | Reinhard Schulz, Martin Roth, Wilhelm Knobloch | 1996-09-10 |