Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7554138 | Method of manufacturing a strained semiconductor layer, method of manufacturing a semiconductor device and semiconductor substrate suitable for use in such a method including having a thin delta profile layer of germanium close to the bottom of the strained layer | Philippe Meunier-Beillard | 2009-06-30 |
| 7157349 | Method of manufacturing a semiconductor device with field isolation regions consisting of grooves filled with isolation material | Jurriaan Schmitz, Rita Rooyackers | 2007-01-02 |