Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6809034 | Method of etching metallic thin film on thin film resistor | Ichiro Ito, Satoshi Shiraki, Tomio Yamamoto, Makoto Ohkawa, Atsumi Takahashi +3 more | 2004-10-26 |
| 6770564 | Method of etching metallic thin film on thin film resistor | Ichiro Ito, Satoshi Shiraki, Tomio Yamamoto, Makoto Ohkawa, Atsumi Takahashi +3 more | 2004-08-03 |
| 6645875 | Method of processing metal and method of manufacturing semiconductor device using the metal | Makoto Ohkawa, Shuichi Ito, Hiroshi Tanaka | 2003-11-11 |
| 6104078 | Design for a semiconductor device having elements isolated by insulating regions | Makio Iida, Mitsuhiro Saitou, Akitaka Murata, Hiroyuki Ban, Tadashi Suzuki +2 more | 2000-08-15 |
| 5644157 | High withstand voltage type semiconductor device having an isolation region | Makio Iida, Shoji Miura, Toshio Sakakibara, Osamu Ishihara | 1997-07-01 |
| 5599722 | SOI semiconductor device and method of producing same wherein warpage is reduced in the semiconductor device | Shoji Miura, Toshio Sakakibara | 1997-02-04 |
| 5592015 | Dielectric isolated type semiconductor device provided with bipolar element | Makio Iida, Tadashi Shibata, Shoji Miura, Toshio Sakakibara | 1997-01-07 |
| 5557134 | Dielectric isolated type semiconductor device | Toshio Sakakibara, Shoji Miura, Makio Iida | 1996-09-17 |
| 5480832 | Method for fabrication of semiconductor device | Shoji Miura, Atsushi Komura, Toshio Sakakibara | 1996-01-02 |
| 5449946 | Semiconductor device provided with isolation region | Toshio Sakakibara, Makio Iida, Shoji Miura | 1995-09-12 |