Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5877095 | Method of fabricating a semiconductor device having a silicon nitride film made of silane, ammonia and nitrogen | Muneo Tamura, Takeshi Yamauchi, Takeshi Fukazawa, Akira Kuroyanagi | 1999-03-02 |
| 5592004 | Silicon nitride film having a short absorption wavelength and surrounding crystal-like grain boundaries | Muneo Tamura, Takeshi Yamauchi, Takeshi Fukazawa, Akira Kuroyanagi, Tooru Yamaoka | 1997-01-07 |