Akiyoshi Asai has been granted 11 US patents while listed as an inventor at Nippondenso Co. . The first was granted in 1994 and the most recent in June 2018. Akiyoshi Asai ranks #435,149 of 4,157,543 US inventors in our database (top 10.5%). Patent records list Akiyoshi Asai in Kariya, MH, JP.
Patents per Year Patents granted per year, 1994 to 2018 Bar chart with a peak of 3 patents in 1998. peak 3 1994: 1 patents 1994 1996: 1 patents 1996 1997: 2 patents 1997 1998: 3 patents 1998 1999: 1 patents 1999 2000: 1 patents 2000 2001: 1 patents 2001 2018: 1 patents 2018
Issued Patents All Time
Showing 1–11 of 11 patents
Patent # Title Co-Inventors Date
10002841
Semiconductor device
Shotaro Miyawaki , Naohiko Hirano , Yasutomi Asai
2018-06-19
6191007
Method for manufacturing a semiconductor substrate
Masaki Matsui , Shoichi Yamauchi , Hisayoshi Ohshima , Kunihiro Onoda , Takanari Sasaya +2 more
2001-02-20
6150697
Semiconductor apparatus having high withstand voltage
Akihiko Teshigahara , Kunihiro Onoda , Hiroyasu Itou , Ryuichirou Abe , Toshio Sakakibara
2000-11-21
5869872
Semiconductor integrated circuit device and manufacturing method for the same
Jun Sakakibara , Megumi Suzuki , Seiji Fujino
1999-02-09
5786616
Semiconductor integrated circuit having an SOI structure, provided with a protective circuit
Harutsugu Fukumoto , Hiroaki Tanaka
1998-07-28
5751041
Semiconductor integrated circuit device
Megumi Suzuki , Jun Sakakibara
1998-05-12
5736770
Semiconductor device with conductive connecting layer and abutting insulator section made of oxide of same material
Nobuyuki Ohya , Mitsutaka Katada
1998-04-07
5663588
Semiconductor device having an SOI structure of mesa isolation type and manufacturing method therefor
Megumi Suzuki , Kazuhiro Tsuruta
1997-09-02
5610426
Semiconductor integrated circuit device having excellent dual polarity overvoltage protection characteristics
Kazuhiro Tsuruta , Takeshi Enya
1997-03-11
5488243
SOI MOSFET with floating gate
Kazuhiro Tsuruta , Hiroaki Himi , Seiji Fujino
1996-01-30
5279981
Method of reducing the trap density of an oxide film for application to fabricating a nonvolatile memory cell
Shigemitsu Fukatsu
1994-01-18