NS

Nobuyuki Sensui

NM Nippon Mektron: 6 patents #23 of 286Top 9%
📍 Kitaibaraki, JP: #26 of 145 inventorsTop 20%
Overall (All Time): #759,019 of 4,157,543Top 20%
7
Patents All Time

Issued Patents All Time

Showing 1–7 of 7 patents

Patent #TitleCo-InventorsDate
6582885 Polyimides, process for producing the same and photosensitive composition containing the same Lin-chiu Chiang, Jenq-Tain Lin 2003-06-24
6486290 Polyimides, process for producing the same and photosensitive composition containing the same Lin-chiu Chiang, Jenq-Tain Lin 2002-11-26
6365324 Photosensitive composition Lin-chiu Chiang, Jenq-Tain Lin 2002-04-02
6245484 Polymides, process for producing the same and photosensitive composition the same Lin-chiu Chiang, Jenq-Tain Lin 2001-06-12
6232039 Photosensitive composition Lin-chiu Chiang, Jenq-Tain Lin 2001-05-15
6096850 Polyimides, process for producing the same and photosensitive composition containing the same Lin-chiu Chiang, Jenq-Tain Lin 2000-08-01
6077924 Polyimides, process for producing the same and photosensitive composition containing the same Lin-chiu Chiang, Jenq-Tain Lin 2000-06-20