LC

Lin-chiu Chiang

NM Nippon Mektron: 11 patents #10 of 286Top 4%
TI The Central Synthetic Rubbers Research Institute: 1 patents #8 of 18Top 45%
📍 Kitaibaraki, JP: #14 of 145 inventorsTop 10%
Overall (All Time): #427,324 of 4,157,543Top 15%
12
Patents All Time

Issued Patents All Time

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
6582885 Polyimides, process for producing the same and photosensitive composition containing the same Jenq-Tain Lin, Nobuyuki Sensui 2003-06-24
6486290 Polyimides, process for producing the same and photosensitive composition containing the same Jenq-Tain Lin, Nobuyuki Sensui 2002-11-26
6365324 Photosensitive composition Jenq-Tain Lin, Nobuyuki Sensui 2002-04-02
6245484 Polymides, process for producing the same and photosensitive composition the same Jenq-Tain Lin, Nobuyuki Sensui 2001-06-12
6232039 Photosensitive composition Jenq-Tain Lin, Nobuyuki Sensui 2001-05-15
6096850 Polyimides, process for producing the same and photosensitive composition containing the same Jenq-Tain Lin, Nobuyuki Sensui 2000-08-01
6077924 Polyimides, process for producing the same and photosensitive composition containing the same Jenq-Tain Lin, Nobuyuki Sensui 2000-06-20
6025461 Photosensitive polyimide Jeng-Tain Lin 2000-02-15
5986038 Adhesive composition Jenq-Tain Lin, Haruyoshi Tatsu, Lev Moiseevich Kogan, Anatoli Stepanovich Skornyakov, Tat'yana Borisovna Zapevalova +2 more 1999-11-16
5942592 Siloxane polyimide and heat-resistant adhesive containing the same Dong Zhao, Hiroshi Sakuyama, Tomoko Katono, Jeng-Tain Lin 1999-08-24
5859181 Siloxane polymide and heat-resistant adhesive containing the same Dong Zhao, Hiroshi Sakuyama, Tomoko Katono, Jeng-Tain Lin 1999-01-12
5849932 Bismaleimide compound and process for producing the same 1998-12-15