Issued Patents All Time
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6506662 | Method for forming an SOI substrate by use of a plasma ion irradiation | Atsushi Ogura, Akira Doi, Masayasu Tanjyo | 2003-01-14 |
| 5306672 | Method of manufacturing a semiconductor device wherein natural oxide film is removed from the surface of silicon substrate with HF gas | — | 1994-04-26 |
| 5256455 | Method of forming film of tantalum oxide by plasma chemical vapor deposition | — | 1993-10-26 |