Issued Patents All Time
Showing 26–46 of 46 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6352813 | Photosensitive resin composition and patterning method using the same | Katsumi Maeda, Shigeyuki Iwasa, Etsuo Hasegawa | 2002-03-05 |
| 6287746 | Chemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming mask | Katsumi Maeda, Shigeyuki Iwasa, Etsuo Hasegawa | 2001-09-11 |
| 6248499 | (Meth)acrylate, polymer, photoresist composition, and pattern forming process making use of the composition | Katsumi Maeda, Shigeyuki Iwasa, Etsuo Hasegawa | 2001-06-19 |
| 6146806 | Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same | Katsumi Maeda, Shigeyuki Iwasa, Etsuo Hasegawa | 2000-11-14 |
| 6140010 | Negative type photoresist composition used for light beam with short wavelength and method of forming pattern using the same | Shigeyuki Iwasa, Katsumi Maeda, Etsuo Hasegawa | 2000-10-31 |
| 6106998 | Negative resist materials, pattern formation method making use thereof, and method of manufacturing semiconductor devices | Katsumi Maeda, Shigeyuki Iwasa, Etsuo Hasegawa | 2000-08-22 |
| 6074801 | Negative type photoresist composition used for light beam with short wavelength and method of forming pattern using the same | Shigeyuki Iwasa, Katsumi Maeda, Etsuo Hasegawa | 2000-06-13 |
| 6030747 | Chemically amplified resist large in transparency and sensitivity to exposure light less than 248 nanometer wavelength and process of forming mask | Katsumi Maeda, Shigeyuki Iwasa, Etsuo Hasegawa | 2000-02-29 |
| 5994025 | Photoresist, compounds for composing the photoresist, and method of forming pattern by using the photoresist | Shigeyuki Iwasa, Katsumi Maeda, Takeshi Ohfuji, Etsuo Hasegawa | 1999-11-30 |
| 5985522 | Photoresist and compounds for composing the photoresist | Shigeyuki Iwasa, Katsumi Maeda, Takeshi Ohfuji, Etsuo Hasegawa | 1999-11-16 |
| 5866304 | Photosensitive resin and method for patterning by use of the same | Shigeyuki Iwasa, Etsuo Hasegawa | 1999-02-02 |
| 5770346 | Photoresist and compounds for composing the photoresist | Shigeyuki Iwasa, Katsumi Maeda, Takeshi Ohfuji, Etsuo Hasegawa | 1998-06-23 |
| 5756850 | Sulfonium salts having bridged cyclic alkyl group useful as resist for deep UV lithography | Shigeyuki Iwasa, Etsuo Hasegawa | 1998-05-26 |
| 5747622 | Polymer having silicon atoms and sulfonium salt units and photoresist compositions containing the same | Katsumi Maeda, Shigeyuki Iwasa, Etsuo Hasegawa | 1998-05-05 |
| 5738975 | Photosensitive resin and method for patterning by use of the same | Shigeyuki Iwasa, Etsuo Hasegawa | 1998-04-14 |
| 5691111 | Photosensitive resin composition useful as resist for deep UV lithography containing sulfonium salts | Shigeyuki Iwasa, Etsuo Hasegawa | 1997-11-25 |
| 5665518 | Photoresist and monomer and polymer for composing the photoresist | Katsumi Maeda, Takeshi Ohfuji, Etsuo Hasegawa | 1997-09-09 |
| 5635332 | Alkylsulfonium salts and photoresist compositions containing the same | Katsumi Maeda, Shigeyuki Iwasa, Etsuo Hasegawa | 1997-06-03 |
| 5621019 | Monomer having vinyl group, polymer thereof and photosensitive resin including those | Shigeyuki Iwasa, Etsuo Hasegawa | 1997-04-15 |
| 5585507 | Alkylsulfonium salts and photoresist compositions containing the same | Katsumi Maeda, Shigeyuki Iwasa, Etsuo Hasegawa | 1996-12-17 |
| 5439990 | Photolytic polymer and photoresist composition | Katsumi Maeda, Etsuo Hasegawa | 1995-08-08 |