AI

Atsushi Itsuki

MM Mitsubishi Materials: 8 patents #111 of 1,543Top 8%
KC Kojundo Chemical Laboratory Co.: 2 patents #3 of 12Top 25%
Overall (All Time): #493,840 of 4,157,543Top 15%
10
Patents All Time

Issued Patents All Time

Showing 1–10 of 10 patents

Patent #TitleCo-InventorsDate
11613809 Solid vaporization/supply system of metal halide for thin film deposition Hiroshi Matsumoto 2023-03-28
11566326 Vaporizable source material container and solid vaporization/supply system using the same Hiroshi Matsumoto 2023-01-31
7196211 Hafnium-containing material for film formation, method for producing the same, and method for producing hafnium-containing thin film using the same Nobuyuki Soyama, Akio Yanagisawa 2007-03-27
7148367 Organometallic compound, its synthesis method, and solution raw material and metal-containing thin film containing the same 2006-12-12
6485554 Solution raw material for forming composite oxide type dielectric thin film and dielectric thin film Taiji Tachibana, Katsumi Ogi 2002-11-26
6355097 Organic titanium compound suitable for MOCVD Taiji Tachibana, Hiroto Uchida, Katsumi Ogi 2002-03-12
6310228 Organic copper compound, liquid mixture containing the compound, and copper thin-film prepared using the solution Katsumi Ogi 2001-10-30
6280518 Organic titanium compound suitable for MOCVD Taiji Tachibana, Hiroto Uchida, Katsumi Ogi 2001-08-28
5767302 High-purity TI complexes, methods for producing the same and BST film-forming liquid compositions Katsumi Ogi, Hiroto Uchida, Kazuo Wakabayashi 1998-06-16
5696384 Composition for formation of electrode pattern Katsumi Ogi, Hiroto Uchida 1997-12-09