Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12338381 | Protective fluid for alumina, protection method, and production method for semiconductor substrate having alumina layer using same | Priangga Perdana Putra, Akinobu HORITA | 2025-06-24 |
| 11629315 | Aqueous composition and cleaning method using same | Takahiro Kikunaga, Akinobu HORITA, Kenji Yamada | 2023-04-18 |
| 11613720 | Aqueous composition and cleaning method using same | Akinobu HORITA, Takahiro Kikunaga, Kenji Yamada | 2023-03-28 |
| 11479744 | Composition having suppressed alumina damage and production method for semiconductor substrate using same | Akinobu HORITA, Kenji Yamada, Takahiro Kikunaga | 2022-10-25 |
| 11352593 | Aqueous composition and cleaning method using same | Akinobu HORITA, Takahiro Kikunaga, Kenji Yamada | 2022-06-07 |
| 11193094 | Liquid composition for reducing damage of cobalt, alumina, interlayer insulating film and silicon nitride, and washing method using same | Priangga Perdana Putra, Akinobu HORITA | 2021-12-07 |
| 10689573 | Wet etching composition for substrate having SiN layer and Si layer and wet etching method using same | Akinobu HORITA, Kenji Shimada, Kenichi Takahashi, Aya Ito | 2020-06-23 |
| 10651028 | Semiconductor element cleaning solution that suppresses damage to tungsten-containing materials, and method for cleaning semiconductor element using same | Kenji Shimada | 2020-05-12 |
| 10629426 | Semiconductor element cleaning solution that suppresses damage to cobalt, and method for cleaning semiconductor element using same | Kenji Shimada | 2020-04-21 |
| 10538718 | Cleaning solution and cleaning method for material comprising carbon-incorporated silicon oxide for use in recycling wafer | Kenji Shimada | 2020-01-21 |
| 10377978 | Alkaline earth metal-containing cleaning solution for cleaning semiconductor element, and method for cleaning semiconductor element using same | Kenji Shimada | 2019-08-13 |
| 10160938 | Semiconductor element cleaning solution that suppresses damage to tantalum-containing materials, and cleaning method using same | Kenji Shimada | 2018-12-25 |
| 10035978 | Semiconductor element cleaning liquid and cleaning method | Kenji Shimada | 2018-07-31 |
| 9422512 | Cleaning liquid for semiconductor elements and cleaning method using same | Kenji Shimada, Ryota Nakayama, Masaru Ohto | 2016-08-23 |