Issued Patents All Time
Showing 1–25 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12310226 | Display device | Keiji Aota, Toshio Etoh, Tsugio Nakazono | 2025-05-20 |
| 12029100 | Method for manufacturing display device | Katsuhiro Yamaguchi, Keiji Aota | 2024-07-02 |
| 5792314 | Method of removing photosensitive resin and photosensitive resin removing apparatus | Hiroyuki Shima | 1998-08-11 |
| 5736745 | Contamination evaluating apparatus | Makiko Nagashima | 1998-04-07 |
| 5723982 | Apparatus for analyzing thin film property | Takao Yasue | 1998-03-03 |
| 5720814 | Photoresist coating apparatus | Motoshi Takagi | 1998-02-24 |
| 5710066 | Method of forming fine patterns | Chikayuki Okamoto, Satoru Kawazu | 1998-01-20 |
| 5702849 | Mask for transferring a pattern for use in a semiconductor device and method of manufacturing the same | Hirofumi Sakata | 1997-12-30 |
| 5688723 | Method of forming fine patterns | Chikayuki Okamoto, Satoru Kawazu | 1997-11-18 |
| 5656809 | Atomic force microscope and measuring head thereof with linearly polarized reflected light | Norihisa Miyashita | 1997-08-12 |
| 5652428 | Method of using scanning probe microscope allowing cleaning of probe tip in ambient atmosphere | Takao Yasue | 1997-07-29 |
| 5622787 | Mask for transferring a pattern for use in a semiconductor device and method of manufacturing the same | Hirofumi Sakata | 1997-04-22 |
| 5595941 | Method of forming fine patterns | Chikayuki Okamoto, Satoru Kawazu | 1997-01-21 |
| 5530253 | Sample stage for scanning probe microscope head | Takao Yasue | 1996-06-25 |
| 5477732 | Adhesion measuring method | Takao Yasue | 1995-12-26 |
| 5469733 | Cantilever for atomic force microscope and method of manufacturing the cantilever | Takao Yasue | 1995-11-28 |
| 5465145 | Semiconductor wafer inspection apparatus | Yukiko Nakashige | 1995-11-07 |
| 5267066 | Liquid crystal display device, method of correcting defective pixels, and defective-pixel correcting apparatus used therein | Syunzi Nakai, Toshio Maeda, Teruo Horii, Seiichi Kajitani, Shigeharu Ino | 1993-11-30 |
| 5193385 | Cantilever for use in atomic force microscope and manufacturing method therefor | Takao Yasue, Hiroshi Koyama | 1993-03-16 |
| 5130273 | Method for manufacturing a read only memory device using a focused ion beam to alter superconductivity | Yoji Mashiko | 1992-07-14 |
| 5107114 | Fine scanning mechanism for atomic force microscope | Takao Yasue, Hiroshi Koyama | 1992-04-21 |
| 5043290 | Process for forming electrodes for semiconductor devices by focused ion beam technology | Yoji Mashiko, Hiroaki Morimoto, Hiroshi Koyama | 1991-08-27 |
| 4990489 | Read only memory device including a superconductive electrode | Yoji Mashiko | 1991-02-05 |
| 4962059 | Process for forming electrodes for semiconductor devices using focused ion beam deposition | Yoji Mashiko, Hiroaki Morimoto, Hiroshi Koyama | 1990-10-09 |
| 4952421 | Method for repairing a pattern | Hiroaki Morimoto, Hiroshi Onoda | 1990-08-28 |