Issued Patents All Time
Showing 26–41 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6545308 | Funnel shaped structure in polysilicon | David J. Keller, Louie Liu | 2003-04-08 |
| 6432765 | Funnel shaped structure in polysilicon and method of making | David J. Keller, Louie Liu | 2002-08-13 |
| 6410948 | Memory cell arrays comprising intersecting slanted portions | Luan C. Tran, D. Mark Duncan, Tyler Lowrey, Rob B. Kerr | 2002-06-25 |
| 6380026 | Processing methods of forming integrated circuitry memory devices, methods of forming DRAM arrays, and related semiconductor masks | — | 2002-04-30 |
| 6271558 | Capacitors and capacitor construction | Gurtej S. Sandhu | 2001-08-07 |
| 6235578 | Processing methods of forming integrated circuitry memory devices, methods of forming DRAM arrays, and related semiconductor masks | — | 2001-05-22 |
| 6103570 | Method of forming capacitors having an amorphous electrically conductive layer | Gurtej S. Sandhu | 2000-08-15 |
| 6025221 | Processing methods of forming integrated circuitry memory devices, methods of forming DRAM arrays, and related semiconductor masks | — | 2000-02-15 |
| 6018173 | Vertically oriented capacitor structure with sloped contact opening and method for etching sloped contact openings in polysilicon | David J. Keller, Louie Liu | 2000-01-25 |
| 6010930 | Vertically oriented structure with sloped opening and method for etching | David J. Keller, Louie Liu | 2000-01-04 |
| 5854734 | Capacitor construction | Gurtej S. Sandhu | 1998-12-29 |
| 5812360 | Capacitor construction having an amorphous electrically conductive layer | Gurtej S. Sandhu | 1998-09-22 |
| 5665625 | Method of forming capacitors having an amorphous electrically conductive layer | Gurtej S. Sandhu | 1997-09-09 |
| 5652170 | Method for etching sloped contact openings in polysilicon | David J. Keller, Louie Liu | 1997-07-29 |
| 5608247 | Storage capacitor structures using CVD tin on hemispherical grain silicon | — | 1997-03-04 |
| 5418180 | Process for fabricating storage capacitor structures using CVD tin on hemispherical grain silicon | — | 1995-05-23 |