Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7125809 | Method and material for removing etch residue from high aspect ratio contact surfaces | Larry Hillyer, Steve Byrne, Doug Hahn | 2006-10-24 |
| 6847085 | High aspect ratio contact surfaces having reduced contaminants | Larry Hillyer, Steve Byrne, Doug Hahn | 2005-01-25 |
| 6455406 | Semiconductor processing method of forming a conductive connection through WxSiyNz material with specific contact opening etching | Richard Linderer | 2002-09-24 |