Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5362606 | Positive resist pattern formation through focused ion beam exposure and surface barrier silylation | John Melngailis, David C. Shaver | 1994-11-08 |
| 5318870 | Method of patterning a phenolic polymer film without photoactive additive through exposure to high energy radiation below 225 nm with subsequent organometallic treatment and the associated imaged article | — | 1994-06-07 |
| 5139925 | Surface barrier silylation of novolak film without photoactive additive patterned with 193 nm excimer laser | — | 1992-08-18 |
| 4892617 | Processes involving lithographic materials | Frank S. Bates, Anthony E. Novembre | 1990-01-09 |